The CHA is a multi-pocket electron beam evaporator. It is a high vacuum (10-6 Torr) e- beam evaporation system that can be used to deposit metals and dielectrics. The system can accommodate up to six crucibles at a time to allow multiple and sequential deposition. The planetary wafer holder of the system can hold up to 12 four inch wafers.

The CHA Solution electron beam (E-Beam) evaporator process development system is a small-scale vacuum deposition system designed for small lot processing and engineered to handle a wide range of deposition needs. Its fully water cooled stainless steel chamber allows for flexibility in optimizing process start temperatures.